Ultrahigh spatial-frequency, high-contrast periodic structures produced by interference lithography
We have developed a process to produce high-aspect ratio, high- frequency periodic profiles recorded in a photoresist layer by interference lithography. We are able to independently control the period, duty cycle, and sidewall angle of the profiles. High-contrast diazonapthoquinone-based photoresist and single mode operation of the exposure laser are critical. The high-aspect ratio profiles are necessary for many applications such as transfer etch masks for etching oxides and field emitter array patterning. 5 refs., 5 figs.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 489588
- Report Number(s):
- UCRL-JC--124912; CONF-960465--7; ON: DE97052049
- Country of Publication:
- United States
- Language:
- English
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