Ultrahigh spatial-frequency, high-contrast periodic structures produced by interference lithography

Conference · Tue Dec 31 04:00:00 EST 1996

OSTI ID:430433

Nguyen, H T; Britten, J A; Boyd, R D; Shore, B W; Perry, M D ^[1]

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1. Lawrence Livermore National Lab., CA (United States)

During efforts to produce multilayer high efficiency dielectric reflection gratings in oxides, 351nm high efficiency transmission gratings, and other development work, the authors required very high-contrast grating profiles in photoresist. High-contrast profiles are profiles with very steep sidewalls, greater than 80 degrees. It is quite difficult to achieve high-contrast profiles using interference lithography. The electric field distribution is sinusoidal. Therefore, one would conclude that the profile would resemble a sinusoid. Early work with interference lithography produced grating profiles. The authors have learned that if great care is taken in the processing steps, very different profiles can be achieved.

• OSTI ID: 430433
• Report Number(s): CONF-960493--
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
44 INSTRUMENTATION
INCLUDING NUCLEAR AND PARTICLE DETECTORS
DIFFRACTION GRATINGS
FABRICATION
INTERFERENCE