Contrast analysis in two-beam laser interference lithography

Miller, David B.; Jones, Adam; McLeod, Robert R.

doi:10.1364/AO.393741

Contrast analysis in two-beam laser interference lithography

Journal Article · Fri Jun 12 04:00:00 EDT 2020 · Applied Optics

DOI:https://doi.org/10.1364/AO.393741· OSTI ID:1632807

; Jones, Adam; McLeod, Robert R.

Interference lithography enables large area, sub-µm, periodic patterning without photomasks or projection lithography tools. We show that optical contrast, which is the fundamental design variable of interference lithography, enforces coupled constraints on source coherence, beam pointing stability, field size, polarization state, and the intensity balance between beams. The analysis enables selection and alignment tolerance of components to meet a specific design requirement. In particular, the analysis reveals that grating beam splitters are significantly less sensitive to beam pointing and polarization misalignment than plate beam splitters.

Sponsoring Organization:: USDOE

OSTI ID:: 1632807

Journal Information:: Applied Optics, Journal Name: Applied Optics Journal Issue: 18 Vol. 59; ISSN 1559-128X; ISSN APOPAI

Publisher:: Optical Society of AmericaCopyright Statement

Country of Publication:: United States

Language:: English

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