Spectroscopic ellipsometry data analysis: Measured vs. calculated quantities

Conference · Thu May 01 04:00:00 EDT 1997

OSTI ID:485987

Jellison, Jr, G E

Spectroscopic ellipsometry is a very powerful technique for optical characterization of thin-film and bulk materials, but the technique measures functions of complex reflection coefficients, which are usually not of interest per se. The interesting characteristics such as film thickness, surface roughness thickness, and optical functions can be determined only by modeling the near-surface region of the sample. However, the measured quantities are not equivalent to those determined from the modeling. Ellipsometry measurements determine elements of the sample Mueller matrix, but the usual result of modeling calculations are elements of the sample. Often this difference is academic, but if the sample depolarizes the light, it is not. Ellipsometry calculations also include methods for determining the optical functions of materials. Data for bulk materials are usually accurate for substrates, but are not appropriate for most thin films. Therefore, reasonable parameterizations are quite useful in performing spectroscopic ellipsometry data analysis. Recently, there has been an increased interest in anisotropic materials, both in thin-film and bulk form. A generalized procedure will be presented for calculating the elements of the Jones matrix for any number of layers, any one of which may or may not be uniaxial.

• Research Organization: Oak Ridge National Lab., TN (United States)
• Sponsoring Organization: USDOE Office of Energy Research, Washington, DC (United States)
• DOE Contract Number: AC05-96OR22464
• OSTI ID: 485987
• Report Number(s): CONF-9705124--1; ON: DE97006445
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
DATA ANALYSIS
ELLIPSOMETRY
MEASURING METHODS
OPTICAL PROPERTIES
SOLIDS
THIN FILMS