Sputtering of Gold by Low Energy Inert Gas Ions
Journal Article
·
· Journal of Applied Physics
The sputtering yield of Au bombarded by 20 to 100 ev He, Ne, and Ar ions was measured by the increase in electrical resistance of a thin Au film. For Ne and Ar, the yield decreases rapidly with decreasing ion energy from 100 to 40 ev; below 40 ev, the decrease is less rapid and no definite threshold was found. For 40-ev Ne ions, the yield is proportional to the ion current density; for Ar ions at this energy, the yield is independent of the current. For currents greater than 100 mu a/cm2. Ne is more efficient than Ar in sputtering Au. To explain the variation yield with ion current for low-energy Ne ions, it is suggested that the sputtering may take place by a two-stage process: the first stage being the creation of defects in the Au by the ions, and the second stage, ejection or Au atoms from the neighborhood of these defects.
- Research Organization:
- Univ. of Melbourne
- Sponsoring Organization:
- USDOE
- NSA Number:
- NSA-16-022757
- OSTI ID:
- 4811879
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 6 Vol. 33; ISSN JAPIAU; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
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