SPUTTERING YIELDS OF METALS FOR Ar$sup +$ AND Ne$sup +$ IONS WITH ENERGIES FROM 50 TO 600 ev

Journal Article · Wed Mar 01 04:00:00 EST 1961 · Journal of Applied Physics (U.S.)

DOI:https://doi.org/10.1063/1.1736012· OSTI ID:4057528

Laegreid, N; Wehner, G K

Sputtering yields for polyxrystalline metal and semiconductor targets under normally incident Ar/sup +/ and Ne/sup +/ ion bombardment were measured in the energy range from 50 to 600 ev. The yields (atoms/ion) were determined by measuring the weight loss of spherical targets immersed like large negative Langmuir probes in a dense lowpressure plasma (2 to 5 mu in Ar and approximately 40 mu in Ne), created in a demountable thermionic cathode, low- voltage discharge tube. The yields were found to be independent of gas pressure and ion current density. Sputtering sets in substan tially at approximately the same ion energy for the various metal-gas combinations (40 to 60 ev) but with increasing ion energy rises differently for different materials. Comparing varlous materials, it is found that the yields increase consistently as the d shells are filled, with Cu, Ag, and Au having the highest yields. (auth)

• Research Organization: General Mills, Inc., Minneapolis
• Sponsoring Organization: USDOE
• NSA Number: NSA-15-014860
• OSTI ID: 4057528
• Journal Information: Journal of Applied Physics (U.S.), Journal Name: Journal of Applied Physics (U.S.) Vol. Vol: 32; ISSN JAPIA
• Country of Publication: Country unknown/Code not available
• Language: English

Related Subjects

ARGON
ATOMIC MODELS
CATHODES
COPPER
CRYSTALS
CURRENTS
DENSITY
EFFICIENCY
ELECTRIC DISCHARGES
ELECTRON TUBES
ENERGY
GASES
GOLD
ION BEAMS
IONS
LANGMUIR PROBE
LOSSES
MEASURED VALUES
METALS
NEON
PHYSICS
PLASMA
PRESSURE
QUANTITATIVE ANALYSIS
SAMPLING
SEMICONDUCTORS
SILVER
SPHERES
SPUTTERING
TARGETS
THERMIONICS
TUBES
WEIGHT