LOW TEMPERATURE ANNEALING STAGES OF IRRADIATED COPPER
Journal Article
·
· Proc. Japan Acad.
OSTI ID:4786980
A mechanism, the principal featare of which is the trapping of interstitial atoms by impurity atoms, is proposed to explain the annealing stages of Cu from about 14 to 473 deg K. (T.F.H.)
- Research Organization:
- Tokyo Univ.
- NSA Number:
- NSA-16-016794
- OSTI ID:
- 4786980
- Journal Information:
- Proc. Japan Acad., Journal Name: Proc. Japan Acad. Vol. Vol: 36
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
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Sun Dec 31 23:00:00 EST 1978
·
OSTI ID:5659458