Two-dimensional fluid model simulation of bell jar top inductively coupled plasma
Journal Article
·
· IEEE Transactions on Plasma Science
OSTI ID:471117
- CFD Research Corp., Huntsville, AL (United States)
- Univ. of California, Berkeley, CA (United States). Dept. of Chemical Engineering
- Chinese Academy of Sciences, Beijing (China). Inst. of Mechanics
In the present paper, argon (Ar) plasmas in a bell jar inductively coupled plasma (ICP) source are systematically studied over pressures from 5 to 20 mtorr and power inputs from 0.2 to 0.5 kW. In this study, both a two-dimensional (2-D) fluid model simulation and global model calculation are compared. The 2-D fluid model simulation with a self-consistent power deposition is developed to describe the Ar plasma behavior as well as predict the plasma parameter distributions. Finally, a quantitative comparison between the global model and the fluid model is made to test their validity. Low-pressure ICP has been employed for etching processing for the last few years.
- OSTI ID:
- 471117
- Journal Information:
- IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Journal Issue: 1 Vol. 25; ISSN ITPSBD; ISSN 0093-3813
- Country of Publication:
- United States
- Language:
- English
Similar Records
Two-dimensional fluid model of high density inductively coupled plasma sources
Experiments and modeling with a large-area inductively coupled plasma (ICP) source
A 3-dimensional model for inductively coupled plasma etching reactors: Coil generated plasma asymmetries
Journal Article
·
Fri Dec 31 23:00:00 EST 1993
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
·
OSTI ID:121624
Experiments and modeling with a large-area inductively coupled plasma (ICP) source
Conference
·
Thu Jun 01 00:00:00 EDT 1995
·
OSTI ID:105681
A 3-dimensional model for inductively coupled plasma etching reactors: Coil generated plasma asymmetries
Conference
·
Mon Dec 30 23:00:00 EST 1996
·
OSTI ID:423024