Two-dimensional fluid model of high density inductively coupled plasma sources

Journal Article · Sat Jan 01 04:00:00 EST 1994 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.587102· OSTI ID:121624

Steward, R A; Graves, D B ^[1]; Vitello, P ^[2]

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1. Univ. California, Berkeley, CA (United States)
2. Lawrence Livermore Lab., CA (United States)

A two-dimensional (r,z) fluid model has been developed to study plasma transport in inductively coupled plasmas (ICP). Electron heating is treated by assuming a fixed, spatially varing power deposition profile in the electron energy balance equation. A high aspect ration ICP reactor geometry has been studied, with two assumed power profiles: spatially uniform and localized to within several skin depths of the radial wall. The effect of neutral gas pressure on plasma uniformity is presented for an argon discharge over the range of 1-20 mTorr. Comparisons between the fluid model and predictions from a spatially averaged global model show similar scaling of plasma density, electron temperature, and plasma potential over a wide range of pressure and power. 20 refs., 10 figs., 1 tab.

• Sponsoring Organization: USDOE
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 121624
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 1 Vol. 12; ISSN 0734-211X; ISSN JVTBD9
• Country of Publication: United States
• Language: English

Related Subjects

66 PHYSICS
ELECTRIC DISCHARGES
ELECTRON TEMPERATURE
FLOW MODELS
PLASMA DENSITY
PLASMA FLUID EQUATIONS
PLASMA PRODUCTION
TWO-DIMENSIONAL CALCULATIONS