In-situ and ex-situ AFM imaging of {mu}N load indents on silicate glass/alumina interfaces

Conference · Tue Dec 31 04:00:00 EST 1996

OSTI ID:468893

Zagrebelny, A V; Lilleodden, E T; Nelson, J C ^[1]

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1. Univ. of Minnesota, Minneapolis, MN (United States); and others

In the present study, interfaces between silicate glass and single-crystal {alpha}-Al{sub 2}O{sub 3} have been studied using (AFM) atomic force microscopy and nanoindentation. The interfaces between the glass and the crystalline grains were prepared by growing films of anorthite (CaAl{sub 2}Si{sub 2}O{sub 8}) composition with thickness ranging 100-200 nm on single-crystal sapphire substrates of (1120) (A-plane) and 1{bar 1}02 (R-plane) crystallographic orientations by pulsed-laser deposition (PLD). Some specimens were subjected to heat treatments in a conventional box furnace causing films to dewet the substrates. Fig. 1 shows schematically the morphology of the dewetted film which has resulted in the formation of distinctive islands, 0.5-2 {mu}m in size. Both types of specimens were tested with two different micro/nanomechanical testers.

• OSTI ID: 468893
• Report Number(s): CONF-960877--
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM OXIDES
GLASS
HEAT TREATMENTS
IMAGES
INTERFACES
MICROSTRUCTURE