FILM DEPOSITION USING ACCELERATED IONS
Journal Article
·
· Electrochemical Technology (U.S.) Absorbed by J. Electrochem. Soc.
OSTI ID:4672659
- Research Organization:
- Sandia Corp., Albuquerque, N. Mex.
- NSA Number:
- NSA-19-007879
- OSTI ID:
- 4672659
- Report Number(s):
- TID-18639; 0424-8090
- Journal Information:
- Electrochemical Technology (U.S.) Absorbed by J. Electrochem. Soc. , Journal Name: Electrochemical Technology (U.S.) Absorbed by J. Electrochem. Soc. Vol. Vol: 2; ISSN ECTCA
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
Similar Records
FILM DEPOSITION USING ACCELERATED IONS
Optical properties of ThF/sub 4/ films deposited using ion-assisted deposition
Control of microstructure and properties of copper films using ion-assisted deposition
Technical Report
·
Thu Oct 31 23:00:00 EST 1963
·
OSTI ID:4038817
Optical properties of ThF/sub 4/ films deposited using ion-assisted deposition
Journal Article
·
Tue Sep 15 00:00:00 EDT 1987
· Appl. Opt.; (United States)
·
OSTI ID:6392709
Control of microstructure and properties of copper films using ion-assisted deposition
Journal Article
·
Sun May 01 00:00:00 EDT 1988
· J. Vac. Sci. Technol., A; (United States)
·
OSTI ID:5312498