Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Ferroelectric field effect in ultrathin SrRuO{sub 3} films

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.118203· OSTI ID:463422
; ; ;  [1]; ; ;  [2]; ;  [3]
  1. Department of Applied Physics, Stanford University, Stanford, California 94305 (United States)
  2. DPMC University of Geneva, 1211 Geneva 4 (Switzerland)
  3. Conductus Incorporated, Sunnyvale, California 94086 (United States)
We report the observation of a ferroelectric field effect in the conducting oxide SrRuO{sub 3} using Pb(Zr{sub 0.52}Ti{sub 0.48})O{sub 3}/SrRuO{sub 3} epitaxial heterostructures. Upon reversing the polarization of the ferroelectric Pb(Zr{sub 0.52}Ti{sub 0.48})O{sub 3} layer, we measured a 9{percent} change in the resistance of a nominally 30 {Angstrom} SrRuO{sub 3} film at room temperature. This change was nonvolatile for a period of several days. Conductivity measurements taken between 4.2 and 300 K are consistent with n-type conduction throughout this temperature range. Hall effect measurements also yield n-type conduction, with n{approx}2{times}10{sup 22} electrons/cm{sup 3}, and furthermore allow us to understand quantitatively the magnitude of the observed resistivity change. {copyright} {ital 1997 American Institute of Physics.}
OSTI ID:
463422
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 2 Vol. 70; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

Similar Records

Ferroelectric field effect in SrCuO{sub 2} and SrRuO{sub 3} films
Journal Article · Sat Nov 30 23:00:00 EST 1996 · Journal of Low Temperature Physics · OSTI ID:443694

Formation and characteristics of Pb(Zr,Ti)O{sub 3} field-effect transistor with a SiO{sub 2} buffer layer
Journal Article · Tue Dec 31 23:00:00 EST 1996 · Applied Physics Letters · OSTI ID:450187

Thickness dependence of magnetoelectric response for composites of Pb(Zr{sub 0.52}Ti{sub 0.48})O{sub 3} films on CoFe{sub 2}O{sub 4} ceramic substrates
Journal Article · Fri Aug 15 00:00:00 EDT 2014 · AIP Advances · OSTI ID:22299755