X-ray lithography using holographic images
Methods for forming X-ray images having 0.25 {micro}m minimum line widths on X-ray sensitive material are presented. A holographic image of a desired circuit pattern is projected onto a wafer or other image-receiving substrate to allow recording of the desired image in photoresist material. In one embodiment, the method uses on-axis transmission and provides a high flux X-ray source having modest monochromaticity and coherence requirements. A layer of light-sensitive photoresist material on a wafer with a selected surface is provided to receive the image(s). The hologram has variable optical thickness and variable associated optical phase angle and amplitude attenuation for transmission of the X-rays. A second embodiment uses off-axis holography. The wafer receives the holographic image by grazing incidence reflection from a hologram printed on a flat metal or other highly reflecting surface or substrate. In this second embodiment, an X-ray beam with a high degree of monochromaticity and spatial coherence is required. 15 figs.
- Research Organization:
- University of California
- DOE Contract Number:
- AC03-76SF00098
- Assignee:
- Lawrence Berkeley Lab., CA (United States)
- Patent Number(s):
- US 5,612,986/A/
- Application Number:
- PAN: 8-532,458
- OSTI ID:
- 458584
- Country of Publication:
- United States
- Language:
- English
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X-ray lithography using holographic images
A technique for projection x-ray lithography using computer-generated holograms