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X-ray lithography using holographic images

Patent ·
OSTI ID:870875
 [1];  [2]
  1. Berkeley, CA
  2. Sound Beach, NY
+ Show Author Affiliations
Methods for forming X-ray images having 0.25 .mu.m minimum line widths on X-ray sensitive material are presented. A holgraphic image of a desired circuit pattern is projected onto a wafer or other image-receiving substrate to allow recording of the desired image in photoresist material. In one embodiment, the method uses on-axis transmission and provides a high flux X-ray source having modest monochromaticity and coherence requirements. A layer of light-sensitive photoresist material on a wafer with a selected surface is provided to receive the image(s). The hologram has variable optical thickness and variable associated optical phase angle and amplitude attenuation for transmission of the X-rays. A second embodiment uses off-axis holography. The wafer receives the holographic image by grazing incidence reflection from a hologram printed on a flat metal or other highly reflecting surface or substrate. In this second embodiment, an X-ray beam with a high degree of monochromaticity and spatial coherence is required.
Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
DOE Contract Number:
AC03-76SF00098
Assignee:
Lawrence Berkeley Laboratory, University of CA (Berkeley, CA)
Patent Number(s):
US 5612986
OSTI ID:
870875
Country of Publication:
United States
Language:
English

References (6)

Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm journal November 1990
Improved Resolution and Signal‐To‐Noise Ratios in Total Internal Reflection Holograms journal June 1968
Resolution in Holography journal January 1969
Holographic projection of microcircuit patterns journal January 1968
Iterative Method Applied To Image Reconstruction And To Computer-Generated Holograms journal June 1980
Reflective systems design study for soft x-ray projection lithography journal November 1990

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Related Subjects

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