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DEPOSITION OF NIOBIUM THIN FILMS BY dc DIODE AND SUBSTRATE BIAS SPUTTERING.

Journal Article · · J. Appl. Phys., 39: 4157-63(Aug. 1968).
DOI:https://doi.org/10.1063/1.1656940· OSTI ID:4500234
Research Organization:
Bell Telephone Labs., Inc., Murray Hill, N. J.
Sponsoring Organization:
USDOE
NSA Number:
NSA-22-045935
OSTI ID:
4500234
Journal Information:
J. Appl. Phys., 39: 4157-63(Aug. 1968)., Journal Name: J. Appl. Phys., 39: 4157-63(Aug. 1968).
Country of Publication:
Country unknown/Code not available
Language:
English

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Related Subjects

DIODES
FILMS
N32210* --Physics--Atomic & Molecular Physics--Atomic
Electron
Ion & Molecular Beams & Reactions
NIOBIUM
NIOBIUM/deposition of thin films of
by dc diode and substrate bias sputtering
SPUTTERING
THICKNESS