Formation kinetics and structure of silicide coatings on tantalum
Journal Article
·
· Inorg. Mater. (USSR) (Engl. Transl.), v. 9, no. 6, pp. 848-851
OSTI ID:4370354
Diffusion in the system Ta-Si was investigated. The kinetic parameters determining the rate of growth of a TaSi/sub 2/ layer were calculated. They show that the chemical reactions at the interfaces control the process in the initial stage and have a marked effect on the equilibrium surface concentration and the rate of formation of the diffusion layer. (auth)
- Research Organization:
- Physical-Technical Inst., Kharkov
- NSA Number:
- NSA-29-013136
- OSTI ID:
- 4370354
- Journal Information:
- Inorg. Mater. (USSR) (Engl. Transl.), v. 9, no. 6, pp. 848-851, Journal Name: Inorg. Mater. (USSR) (Engl. Transl.), v. 9, no. 6, pp. 848-851; ISSN INOMA
- Country of Publication:
- Country unknown/Code not available
- Language:
- English
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