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Growth and characterization of CuInSe{sub 2} epitaxial films for device applications

Book ·
OSTI ID:417682

CuInSe{sub 2} (CIS) epitaxial layers have been grown on both GaAs (001) and In{sub 0.29}Ga{sub 0.71}As pseudo lattice-matched substrates by molecular beam epitaxy, and characterized for device applications. Despite a large lattice mismatch of {Delta}a/a{approximately}2.2%, epitaxial growth of CuInSe{sub 2} has been demonstrated on GaAs (001) showing their film properties strongly dependent on the Cu/In ratio. In-rich films had a large number of twins on {l_brace}112{r_brace} planes, and were found to be heavily compensated. On the other hand, Cu-rich films showed distinct photoluminescence emissions indicating significantly higher film quality in comparison with In-rich films. Two dimensional reciprocal x-ray intensity area mapping and cross-sectional transmission electron microscopy showed the formation of an interfacial layer in the vicinity of the CuInSe{sub 2}/GaAs interface resulting from the strain-induced interdiffusion between CuInSe{sub 2} and GaAs. Reduction in lattice mismatch to {Delta}a/a{approximately}0.2% by using In{sub 0.29}Ga{sub 0.71}As pseudo lattice-matched substrates made possible the growth of high quality CuInSe{sub 2} with predominant free exciton emissions in their photoluminescence spectra and with residual defect densities of as low as p {approximately} 1 {times} 10{sup 17}cm{sup {minus}3} implying the growth of device quality CuInSe{sub 2} epitaxial films.

OSTI ID:
417682
Report Number(s):
CONF-960401--; ISBN 1-55899-329-0
Country of Publication:
United States
Language:
English