Electron-bombardment ion sources
Patent
·
OSTI ID:4085224
An electron-bombardment ion source includes a chamber into which a propellant is introduced. The propellant is ionized by means of electrons drawn toward an anode from a cathode. At one end of the chamber is an apertured screen followed by an aligned apertured grid. The grid is maintained at a potential that accelerates the ions out of the chamber through the screen and the grid. A surface within the chamber, such as the screen, the wall of the chamber or both, and other than the anode and cathode, is maintained at a potential approaching the anode during the initiation of ion production, while being maintained at a potential approaching that on the cathode during steady-state ion production. Conveniently, this is achieved by interposing a resistance, of appropriate value, between that surface and a potential source. (auth)
- Research Organization:
- Originating Research Org. not identified
- NSA Number:
- NSA-33-021110
- Assignee:
- to Ion Tech, Inc.
- Patent Number(s):
- US 3913320
- OSTI ID:
- 4085224
- Country of Publication:
- United States
- Language:
- English
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