Electron bombardment ion sources

Patent · Tue Nov 06 04:00:00 EST 1984

OSTI ID:5884434

Kaufman, H R; Hughes, W E; Robinson, R S

An electron-bombardment ion source includes means defining a chamber for containing an ionizable together with means for introducing such gas into that chamber. Disposed therein is an anode and an electronemissive cathode. The potential impressed between the anode and the cathode to effect electron emission at a sufficient velocity to ionize the gas. Also included are means for accelerating ions out of the chamber together with means for establishing a magnetic field within the chamber that increases the efficiency of ionization of the gas by the electrons. Mounted within the chamber is an anode of non-magnetic material that defines an essentially continuous and smooth surface which encloses substantially all of the volume within which the ionization occurs except the exit for the accelerated ions out of the chamber. The entire design is such as to ensure ready removability of the different components for quick and easy cleaning.

• Assignee: EDB-85-069892
• Patent Number(s): US 4481062
• OSTI ID: 5884434
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
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Heating
& Production
700205 -- Fusion Power Plant Technology-- Fuel
Heating
& Injection Systems
ANODES
BEAMS
CATHODES
CLEANING
CONFINEMENT
DEPOSITION
ELECTRODES
ELECTRON BEAM ION SOURCES
ELECTRON EMISSION
EMISSION
ETCHING
ION BEAMS
ION SOURCES
IONIZATION
PLASMA
PLASMA CONFINEMENT
SURFACE FINISHING