Review of sputter negative ion sources
Journal Article
·
· IEEE Trans. Nucl. Sci., v. NS-23, no. 2, pp. 1098-1103
A brief account of cesium sputter ion sources is presented with particular emphasis being placed on sources that use a cesium beam as the sputter agent. Some thoughts are also presented on the mechanism whereby negative ions are formed by the sputtering of low work function surfaces. The possibility of increasing negative ion yields still further by the depostion of additional neutral cesium or some other alkali metal is discussed.
- Research Organization:
- Univ. of Pennsylvania, Philadelphia
- Sponsoring Organization:
- USDOE
- NSA Number:
- NSA-33-031051
- OSTI ID:
- 4021721
- Journal Information:
- IEEE Trans. Nucl. Sci., v. NS-23, no. 2, pp. 1098-1103, Journal Name: IEEE Trans. Nucl. Sci., v. NS-23, no. 2, pp. 1098-1103; ISSN IETNA
- Country of Publication:
- United States
- Language:
- English
Similar Records
The emittance and brightness characteristics of negative ion sources suitable for MeV ion implantation
Design features of a high-intensity, cesium-sputter/plasma-sputter negative ion source
Design features of a high-intensity, cesium-sputter/plasma-sputter negative ion source
Conference
·
Wed Dec 31 23:00:00 EST 1986
·
OSTI ID:6495303
Design features of a high-intensity, cesium-sputter/plasma-sputter negative ion source
Conference
·
Thu Dec 30 23:00:00 EST 1993
·
OSTI ID:239333
Design features of a high-intensity, cesium-sputter/plasma-sputter negative ion source
Journal Article
·
Wed Jun 01 00:00:00 EDT 1994
· Review of Scientific Instruments; (United States)
·
OSTI ID:7239179