Laser ablation and column formation in silicon under oxygen-rich atmospheres
The microstructure formed at the surface of silicon by cumulative pulsed-laser irradiation in oxygen-rich atmospheres consists of an array of microcolumns surrounded by microcanyons and microholes. Formation of SiO{sub x} at the exposed surface of silicon is most likely responsible for the occurrence of etching/ablation that causes the continuous deepening of canyons and holes. The growth mechanism of columns that is supported by the experimental evidence presented here is a process in which the columns are fed at their tips by the silicon-rich ablation plasma produced during pulsed-laser irradiation.
- Sponsoring Organization:
- (US)
- OSTI ID:
- 40205309
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 19 Vol. 77; ISSN 0003-6951
- Publisher:
- The American Physical Society
- Country of Publication:
- United States
- Language:
- English
Similar Records
Microstructural evolution of laser-exposed silicon targets in SF{sub 6} atmospheres
Silicon microcolumn arrays grown by nanosecond pulsed-excimer laser irradiation
Surface Engineering of Silicon and Carbon by Pulsed-Laser Ablation
Journal Article
·
Mon Sep 11 00:00:00 EDT 2000
· Applied Physics Letters
·
OSTI ID:20217579
Silicon microcolumn arrays grown by nanosecond pulsed-excimer laser irradiation
Journal Article
·
Wed Mar 31 23:00:00 EST 1999
· Applied Physics Letters
·
OSTI ID:336602
Surface Engineering of Silicon and Carbon by Pulsed-Laser Ablation
Conference
·
Sat Feb 27 23:00:00 EST 1999
·
OSTI ID:3663