Microstructural evolution of laser-exposed silicon targets in SF{sub 6} atmospheres

Journal Article · Mon Sep 11 04:00:00 EDT 2000 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.1308538· OSTI ID:20217579

Fowlkes, J D ^[1]; Pedraza, A J ^[1]; Lowndes, D H ^[2]

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1. Department of Materials Science and Engineering, The University of Tennessee, Knoxville, Tennessee 37996-2200 (United States)
2. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6056 (United States)

The microstructures formed at the surface of silicon during pulsed-laser irradiation in SF{sub 6}-rich atmospheres consist of an array of microholes surrounded by microcones. It is shown that there is a dynamic interplay between the formation of microholes and microcones. Fluorine produced by the laser-induced decomposition of SF{sub 6} is most likely responsible for the etching/ablation process. It is proposed that silicon-rich molecules and clusters that form in and are ejected from the continually deepening microholes sustain the axial and lateral growth of the microcones. The laser-melted layer at the tip and sides of the cones efficiently collects the silicon-rich products formed upon ablation. The total and partial pressures of SF{sub 6} in the chamber play a major role in cone development, a clear indication that it is the laser-generated plasma that controls the growth of these cones. (c) 2000 American Institute of Physics.

• OSTI ID: 20217579
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 11 Vol. 77; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ABLATION
ETCHING
EXPERIMENTAL DATA
FLUORINE
LASER RADIATION
MICROSTRUCTURE
RADIATION EFFECTS
SILICON