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Residual arsenic site in oxidized Al{sub x}Ga{sub 1-x}As (x=0.96)

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.1367307· OSTI ID:40205290
X-ray absorption fine-structure spectroscopy is used to determine the site of residual As in wet-oxidized Al{sub 0.96}Ga{sub 0.04}As. In a {approx}0.5-{mu}m-oxide film removed from its GaAs substrate, the remaining As atoms are found to be coordinated with oxygen in the form of amorphous-As oxides, with a mixture of {approx}80%As{sup 3+} and {approx}20%As{sup 5+} sites that are locally similar to As{sub 2}O{sub 3} and As{sub 2}O{sub 5}. No evidence of interstitial or substitutional As, As precipitates, or GaAs is seen, implying that less than 10% of the As atoms are in these forms.
Sponsoring Organization:
(US)
OSTI ID:
40205290
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 17 Vol. 78; ISSN 0003-6951
Publisher:
The American Physical Society
Country of Publication:
United States
Language:
English