Synthesis of InN{sub x}P{sub 1-x} thin films by N ion implantation

Journal Article · Mon Feb 19 04:00:00 EST 2001 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.1350963· OSTI ID:40205280

Yu, K M; Walukiewicz, W; Wu, J; Beeman, J W; Ager, J W; Haller, E E; Shan, W; Xin, H P; Tu, C W

Dilute InN{sub x}P{sub 1-x} alloy thin films were synthesized by nitrogen ion implantation into InP using doses corresponding to N mole fraction up to 0.048. In the films with the highest N contents, it was shown using modulated photoreflectance that the fundamental band gap energy was decreased by up to 180 meV. The band gap reduction is similar in magnitude to that observed in epitaxially grown III--N{sub x}V{sub 1-x} alloys. The InN{sub x}P{sub 1-x} layers were thermally stable up to an annealing temperature of 850{sup o}C. Using the recently developed band anticrossing model which relates the band gap reduction to the N content, we estimate that the maximum mole fraction of N achieved in the InN{sub x}P{sub 1-x} alloys is larger than that reported previously for film grown by chemical vapor deposition and exceeds 0.01.

• Sponsoring Organization: (US)
• OSTI ID: 40205280
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 8 Vol. 78; ISSN 0003-6951
• Publisher: The American Physical Society
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALLOYS
ANNEALING
CHEMICAL VAPOR DEPOSITION
ION IMPLANTATION
NITROGEN IONS
PHYSICS
SYNTHESIS
THIN FILMS