Microstructure and growth mechanism of epitaxial SrRuO{sub 3} thin films on (001) LaAlO{sub 3} substrates
SrRuO{sub 3} thin films deposited on (001) LaAlO{sub 3} substrates by 90{degree} off-axis sputtering at 600{degree}C were studied by atomic force microscopy (AFM) and transmission electron microscopy (TEM). Both AFM and cross-section TEM investigations show that the films have a rough surface. Plan-view TEM studies demonstrate that the films are composed of all three different types of orientation domains (twins). These domain structures and surface morphology are different from the SrRuO{sub 3} film deposited on the (001) SrTiO{sub 3} substrate which has an atomically flat surface and is composed of only the [110]-type domains. The reason for these differences was ascribed as the effect of lattice mismatch across the film/substrate interface. It is proposed that a SrRuO{sub 3} thin film grows on a (001) SrTiO{sub 3} substrate through a two-dimensional nucleation process, while a film on LaAlO{sub 3} grows with three steps: the coherent growth of a few monolayers at the initial stage through a two-dimensional nucleation process; the formation of misfit dislocations when the film reaches a critical thickness; and an island-like growth thereafter due to the nonuniform distribution of stress along the film surface. {copyright} 2001 American Institute of Physics.
- Sponsoring Organization:
- (US)
- OSTI ID:
- 40203768
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 89; ISSN 0021-8979
- Publisher:
- The American Physical Society
- Country of Publication:
- United States
- Language:
- English
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