Direct aerial image measurements to evaluate the performance of an extreme ultraviolet projection lithography system

Journal Article · Thu Oct 31 23:00:00 EST 1996 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.588631· OSTI ID:399797

Fields, C H; Oldham, W G ^[1]; Ray-Chaudhuri, A K; Krenz, K D; Stulen, R H ^[2]

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1. University of California at Berkeley, 550-O Cory Hall, Berkeley, California 94720 (United States)
2. Sandia National Laboratories, Livermore, California 94550 (United States)

We report the application of direct aerial image monitoring to measure the performance of an extreme ultraviolet lithography (EUVL) test bed. There are several issues which might limit the possibility of performing image monitoring experiments on EUVL systems. These issues include: source flux, signal-to-noise ratios, and EUV scanning aperture fabrication. We report the results of initial aerial image scans of equal lines and spaces as well as preliminary measurements of scatter produced by the EUV camera. {copyright} {ital 1996 American Vacuum Society}

• OSTI ID: 399797
• Report Number(s): CONF-960582--
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 6 Vol. 14; ISSN 0734-211X; ISSN JVTBD9
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
APERTURES
EXTREME ULTRAVIOLET RADIATION
FOCUSING
GEOMETRICAL ABERRATIONS
IMAGES
LITHOGRAPHY
NANOSTRUCTURES
OPTICAL SYSTEMS
PERFORMANCE
SIGNAL-TO-NOISE RATIO
TESTING