Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

Conference · Thu Jan 27 04:00:00 EST 2000

OSTI ID:751082

WRONOSKY, JOHN B ^[1]; SMITH, TONY G; CRAIG, MARCUS J; STURGIS, BEVERLY R; DARNOLD, JOEL R; WERLING, DAVID K; KINCY, MARK A; TICHENOR, DANIEL A; WILLIAMS, MARK E; BISCHOFF, PAUL

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1. Sandia National Laboratories

This paper is an overview of the wafer and reticle positioning system of the Extreme Ultraviolet Lithography (EUVL) Engineering Test Stand (ETS). EUVL represents one of the most promising technologies for supporting the integrated circuit (IC) industry's lithography needs for critical features below 100nm. EUVL research and development includes development of capabilities for demonstrating key EUV technologies. The ETS is under development at the EUV Virtual National Laboratory, to demonstrate EUV full-field imaging and provide data that supports production-tool development. The stages and their associated metrology operated in a vacuum environment and must meet stringent outgassing specifications. A tight tolerance is placed on the stage tracking performance to minimize image distortion and provide high position repeatability. The wafer must track the reticle with less than {+-}3nm of position error and jitter must not exceed 10nm rms. To meet these performance requirements, magnetically levitated positioning stages utilizing a system of sophisticated control electronics will be used. System modeling and experimentation have contributed to the development of the positioning system and results indicate that desired ETS performance is achievable.

• Research Organization: Sandia National Labs., Albuquerque, NM (US); Sandia National Labs., Livermore, CA (US)
• Sponsoring Organization: US Department of Energy (US)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 751082
• Report Number(s): SAND2000-0227C
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
CONTROL SYSTEMS
EXTREME ULTRAVIOLET RADIATION
INTEGRATED CIRCUITS
MANUFACTURING
OPTICAL SYSTEMS
PERFORMANCE
POSITIONING
TEST FACILITIES
VACUUM SYSTEMS