EUV Engineering Test Stand

Conference · Mon Feb 14 04:00:00 EST 2000

OSTI ID:792716

Tichenor, D A ^[1]; Kubiak, G D; Replogle, W C; Klebanoff, L E; Wronosky, J B; Hale, L C; Chapman, H N; Taylor, J S; Folta, J A; Montcalm, C; Hudyma, R M

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1. LLNL

The Engineering Test Stand (ETS) is an EUV laboratory lithography tool. The purpose of the ETS is to demonstrate EUV full-field imaging and provide data required to support production-tool development. The ETS is configured to separate the imaging system and stages from the illumination system. Environmental conditions can be controlled independently in the two modules to maximize EUV throughput and environmental control. A source of 13.4 nm radiation is provided by a laser plasma source in which a YAG laser beam is focused onto a xenon-cluster target. A condenser system, comprised of multilayer-coated mirrors and grazing-incidence mirrors, collects the EUV radiation and directs it onto a-reflecting reticle. A four-mirror, ring-field optical system, having a numerical aperture of 0.1, projects a 4x-reduction image onto the wafer plane. This design corresponds to a resolution of 70nm at a k{sub 1} of 0.52. The ETS is designed to produce full-field images in step: and-scan mode using vacuum-compatible, one-dimension-long-travel magnetically levitated stages for both reticle and wafer. Reticle protection is incorporated into the ETS design. This paper provides a system overview of the ETS design and specifications.

• Research Organization: Lawrence Livermore National Lab., CA (US)
• Sponsoring Organization: USDOE Office of Defense Programs (DP) (US)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 792716
• Report Number(s): UCRL-JC-137668
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
APERTURES
DESIGN
LASERS
LIGHTING SYSTEMS
MIRRORS
OPTICAL SYSTEMS
PLASMA
RADIATIONS
RESOLUTION
SPECIFICATIONS