Application of optical filters fabricated by masked ion beam lithography

Journal Article · Fri Nov 01 04:00:00 EST 1996 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.588691· OSTI ID:399793

Morgan, M D; Horne, W E; Sundaram, V ^[1]; Wolfe, J C; Pendharkar, S V ^[2]; Tiberio, R ^[3]

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1. EDTEK, Inc., Kent, Washington 98032 (United States)
2. University of Houston, Houston, Texas 77204 (United States)
3. Cornell Nanofabrication Facility, Cornell University, Ithaca, New York 14853 (United States)

Masked ion beam lithography (MIBL) was employed to fabricate optical filters as a critical component of an energy conversion system which utilizes semiconductor photovoltaics. This article will describe the operation and novel application of these devices and the MIBL pilot production line being facilitized. The conversion concept, thermophotovoltaics (TPV), when coupled with these MIBL produced bandpass filters, is capable of converting heat to electrical power with {gt}20{percent} conversion efficiency. The EDTEK TPV filter is based on a high density array of slotted antenna elements patterned into a single layer of thin gold film. {copyright} {ital 1996 American Vacuum Society}

• OSTI ID: 399793
• Report Number(s): CONF-960582--
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 6 Vol. 14; ISSN JVTBD9; ISSN 0734-211X
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
FABRICATION
GOLD
INFRARED RADIATION
ION BEAMS
LITHOGRAPHY
MASKING
OPTICAL FILTERS
PILOT PLANTS
REFLECTIVITY
THERMOPHOTOVOLTAIC CONVERTERS
THIN FILMS
TRANSMISSION