Prospects for printing very-large-scale integrated circuits with masked ion-beam lithography
Technical Report
·
OSTI ID:5100423
Ions hold a number of advantages over uv photons, x-ray photons, and electrons when used for high-resolution printing. Masked ion beam lithography (MIBL) has demonstrated many of the requirements of a very large scale integrated (VLSI) lithographic tool. Some of the different approaches to MIBL and their advantages will be discussed.
- Research Organization:
- Massachusetts Inst. of Tech., Lexington (USA). Lincoln Lab.
- OSTI ID:
- 5100423
- Report Number(s):
- AD-A-170467/5/XAB; MS-6952
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
99 GENERAL AND MISCELLANEOUS
990200* -- Mathematics & Computers
BEAMS
ELECTROMAGNETIC RADIATION
ELECTRON BEAMS
ELECTRONIC CIRCUITS
ELEMENTARY PARTICLES
INTEGRATED CIRCUITS
ION BEAMS
LEPTON BEAMS
MAGNETIC FIELDS
MASSLESS PARTICLES
MICROELECTRONIC CIRCUITS
PARTICLE BEAMS
PHOTONS
PRINTED CIRCUITS
RADIATIONS
ULTRAVIOLET RADIATION
990200* -- Mathematics & Computers
BEAMS
ELECTROMAGNETIC RADIATION
ELECTRON BEAMS
ELECTRONIC CIRCUITS
ELEMENTARY PARTICLES
INTEGRATED CIRCUITS
ION BEAMS
LEPTON BEAMS
MAGNETIC FIELDS
MASSLESS PARTICLES
MICROELECTRONIC CIRCUITS
PARTICLE BEAMS
PHOTONS
PRINTED CIRCUITS
RADIATIONS
ULTRAVIOLET RADIATION