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Silicon-film{trademark} substrates adapted for low-cost GaAs-based solar cells

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.57987· OSTI ID:355391
; ; ;  [1]
  1. AstroPower, Inc., Solar Park, Newark, Delaware 19716-2000 (United States)

The utilization of polycrystalline silicon or silicon-on-ceramic material as a surrogate substrate for epitaxial GaAs-based solar cells is described. A close-spaced vapor transport (CSVT) process has been developed for epitaxial growth of germanium and GaAs {open_quotes}buffer{close_quotes} layers on polycrystalline silicon. A selective mode of epitaxial growth is preferred due to its potential for stress reduction and monolithic series interconnection. {copyright} {ital 1999 American Institute of Physics.}

Sponsoring Organization:
USDOE
OSTI ID:
355391
Report Number(s):
CONF-980935--
Journal Information:
AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 462; ISSN APCPCS; ISSN 0094-243X
Country of Publication:
United States
Language:
English

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