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Electronic near-surface defect states of bare and metal covered n-GaN films observed by cathodoluminescence spectroscopy

Journal Article · · Journal of Electronic Materials
; ;  [1]; ; ; ;  [2]; ;  [3]
  1. Ohio State Univ., Columbus, OH (United States)
  2. Montana State Univ., Bozeman, MT (United States). Physics Dept.
  3. North Carolina State Univ., Raleigh, NC (United States). Dept. of Physics
The electronic states at metal contacts to GaN are of significant concern for a wide range of microelectronic and optoelectronic device applications. Depth-dependent low energy cathodoluminescence spectroscopy (CLS) has been used to investigate the near-surface optical properties of n-type GaN epilayers grown under various growth conditions. Both bare and reacted-Mg/n-GaN and Al/n-GaN (annealed to 1,000 C) surfaces were investigated. The authors find enhanced emission at {approximately} 1.4, 1.6, and 2.2 eV from states within the n-type GaN bandgap near the interface of the reacted Mg with the semiconductor, which correlates with previous measurements of Schottky barrier formation on the same specimens. No clear evidence for p-type doping at the reacted interfacial layer is apparent. For Al on n-type GaN, CLS emission is dominated before and after metallization by yellow emission, which correlates only weakly with the Fermi level stabilization energy. Instead, the authors observe emission above the GAN band edge emission at 3.85 eV, due either to deep level emission from AlN or to the formation of the alloy Al{sub x}Ga{sub 1{minus}x}N (x {approx} 0.2) in the reacted near-surface region.
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
FG02-97ER45666
OSTI ID:
345076
Report Number(s):
CONF-9806176--
Journal Information:
Journal of Electronic Materials, Journal Name: Journal of Electronic Materials Journal Issue: 3 Vol. 28; ISSN JECMA5; ISSN 0361-5235
Country of Publication:
United States
Language:
English

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