Effects of isochronal annealing and irradiation temperature on radiation-induced trapped charge
Journal Article
·
· IEEE Transactions on Nuclear Science
- Sandia National Labs., Albuquerque, NM (United States)
- CEA, Bruyeres-Le-Chatel (France). Centre d`Etudes de Bruyeres
Radiation-induced trapped charge densities in 45-nm radiation-hardened oxides are estimated via capacitance-voltage (C-V) and thermally stimulated current (TSC) techniques as functions of irradiation and/or isochronal anneal temperature. Reductions in trapped-hole charge were greater for {minus}10 V and 0 V isochronal anneals than for 10 V anneals. This is attributed to enhanced electron-hole dipole pairing during positive-bias anneal. Between 22 C and 125 C, the trapped electron charge increases for 10 V isochronal anneals, and is approximately constant for 0 V and {minus}10 V anneals. Interface-trap charge decreases for 0 V isochronal annealing above 80 C, and {+-}10 V annealing above 100 C. Elevated temperature irradiation at 10 V shows similar trends to 10 V isochronal anneals. Trapped-hole energy scales derived from C-V measurements for positive or zero bias isochronal anneals are found to be inaccurate, due to the different temperature dependencies of trapped-hole annealing and trapped-electron buildup. Refined estimates of trapped-hole attempt-to-escape frequency are obtained via TSC. Isochronal annealing and elevated temperature irradiation techniques generally cannot be used for hardness assurance testing unless the results are calibrated to the low-rate irradiation or long-term annealing response for a given technology.
- Research Organization:
- Sandia National Laboratory
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 323910
- Report Number(s):
- CONF-980705--
- Journal Information:
- IEEE Transactions on Nuclear Science, Journal Name: IEEE Transactions on Nuclear Science Journal Issue: 6Pt1 Vol. 45; ISSN 0018-9499; ISSN IETNAE
- Country of Publication:
- United States
- Language:
- English
Similar Records
Considerations on isochronal anneal technique: From measurement to physics
Effect on bias on thermally stimulated current (TSC) in irradiated MOS devices
Trapped-hole annealing and electron trapping in metal-oxide-semiconductor devices
Journal Article
·
Tue Nov 30 23:00:00 EST 1999
· IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers)
·
OSTI ID:20014707
Effect on bias on thermally stimulated current (TSC) in irradiated MOS devices
Conference
·
Sat Nov 30 23:00:00 EST 1991
· IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
·
OSTI ID:5707978
Trapped-hole annealing and electron trapping in metal-oxide-semiconductor devices
Journal Article
·
Mon Apr 20 00:00:00 EDT 1992
· Applied Physics Letters; (United States)
·
OSTI ID:7237690