Epitaxial growth mechanism and physical properties of ultra thin films of La{sub 0.6}Sr{sub 0.4}MnO{sub 3}

Book · Thu Dec 31 04:00:00 EST 1998

OSTI ID:323389

Konishi, Yoshinori; Kasai, Masahiro ^[1]; Kawasaki, Masashi ^[2]; Tokura, Yoshinori ^[1]

---

1. Joint Research Center for Atom Technology, Tsukuba (Japan)
2. Joint Research Center for Atomic Technology, Tsukuba (Japan)

Thin films of La{sub 1{minus}x}Sr{sub x}MnO{sub 3} (x = 0.4) were fabricated using pulsed laser deposition (PLD) methods. The surface morphology of the films was sensitively affected by oxygen pressure during deposition. At high oxygen pressure ({approximately} 150 mTorr), randomly aligned grains were nucleated on the epitaxial film. When the pressure was reduced to 100 mTorr, the epitaxial film had very smooth surface. Under this condition, the thickness dependence of resistivity and magnetization were analyzed. Even 6 nm thick film showed ferromagnetic metallic behavior. The AFM images of ultra thin films deposited on wet-etched SrTiO{sub 3} showed atomically flat terraces and 0.4 nm steps. The film growth mode can be tuned to either layer by layer or step flow by the deposition temperature.

• Sponsoring Organization: New Energy and Industrial Technology Development Organization, Tokyo (Japan)
• OSTI ID: 323389
• Report Number(s): CONF-971201--; ISBN 1-55899-399-1
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
EXPERIMENTAL DATA
LANTHANUM OXIDES
LASERS
MANGANESE OXIDES
MORPHOLOGY
PHYSICAL PROPERTIES
STRONTIUM OXIDES
THIN FILMS
VAPOR PHASE EPITAXY