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Effects of burn-in on radiation hardness

Journal Article · · IEEE Transactions on Nuclear Science
DOI:https://doi.org/10.1109/23.340615· OSTI ID:32029

Transistors and ICs were irradiated with or without pre-irradiation elevated-temperature biased stresses (i.e., burn-in). These stresses lead to larger radiation-induced transistor threshold-voltage shifts and increases in IC static power supply leakage current (two orders of magnitude) in stressed ICs than for ICs not subjected to a stress. In addition, these stresses led to reduced degradation in timing parameters. The major cause of the differences is less radiation-induced interface-trap buildup for transistors subjected to an elevated-temperature biased stress. These results were observed for two distinctly different technologies and have significant implications on hardness assurance testing. One could significantly (1) overestimate degradation in timing parameters resulting in the rejection of acceptable ICs and increased system cost, or (2) underestimate the increase in static supply leakage current of ICs leading to system failure. These results suggest that radiation qualification testing must be performed on integrated circuits that have been subjected to all high-temperature biased stresses experienced in normal production flow or system use.

Research Organization:
Sandia National Laboratory
DOE Contract Number:
AC04-94AL85000
OSTI ID:
32029
Report Number(s):
CONF-940726--
Journal Information:
IEEE Transactions on Nuclear Science, Journal Name: IEEE Transactions on Nuclear Science Journal Issue: 6Pt1 Vol. 41; ISSN IETNAE; ISSN 0018-9499
Country of Publication:
United States
Language:
English

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