Macro- and microstrain relaxation in annealed Ag films during ageing at room temperature

Conference · Thu Dec 31 04:00:00 EST 1998

OSTI ID:305511

Currie, R C; Delhez, R ^[1]; Mittemeijer, E J ^[2]

---

1. Delft Univ. of Technology (Netherlands). Lab. of Materials Science
2. Delft Univ. of Technology (Netherlands). Lab. of Material Science

The relaxation of thermally induced strain in 500 nm thick polycrystalline Ag layers electron-beam deposited onto Si wafers was traced during ageing at room temperature. The layers consisted predominantly of matrix crystallites with {l_brace}111{r_brace} planes parallel to the surface and twin crystallites with {l_brace}511{r_brace} planes parallel to the surface. The macrostrain in the plane of the layer was determined from the X-ray diffraction line-profile position and the microstrain from the diffraction-line broadening. The residual macrostress relaxed from 160 MPa to 30 MPa in the matrix crystallites and from 170 MPa to 50 MPa in the twin crystallites. Simultaneously with the decrease in macrostress the microstrain decreases significantly for both texture fractions. The strain relaxation behavior is governed by movement and subsequent annihilation of defects in the layer.

• OSTI ID: 305511
• Report Number(s): CONF-971201--
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AGING
AMBIENT TEMPERATURE
CRYSTAL DEFECTS
MICROSTRUCTURE
SILVER
STRESS ANALYSIS
STRESS RELAXATION
THERMAL STRESSES
THIN FILMS
X-RAY DIFFRACTION