High-rate magnetron sputter deposition of low-stress boron carbide films on tilted substrates

Kawasaki, K.; Merlo, J. B.; Gonzalez, S.; Bayu Aji, L. B.; Shin, S. J.; Taylor, G. V.; Engwall-Holmes, A. M.; Seo, M.; Baker, A. A.; Wong, M. S.; O’Neill, F. M.; Kucheyev, Sergei O.

doi:10.1063/5.0283657

High-rate magnetron sputter deposition of low-stress boron carbide films on tilted substrates

Journal Article · Mon Sep 08 00:00:00 EDT 2025 · Journal of Applied Physics

DOI:https://doi.org/10.1063/5.0283657· OSTI ID:3000816

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Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States); Blue Laser Fusion Inc., Goleta, CA (United States)

Boron carbide is attractive for several applications, including nuclear fuel capsules for inertial confinement fusion (ICF). The fabrication of ICF capsules involves the deposition of ultrathick coatings with density and thickness uniformity on submicron length scales on non-planar (spherical) substrates. Such a deposition requires control of the deposition rate, residual stress, and film microstructure. Here, we systematically study the direct-current magnetron sputter deposition of B₄C coatings with a full-face-erosion magnetron source as a function of substrate tilt and Ar working gas pressure. Film properties are correlated with results of plasma diagnostics and predictions of Monte Carlo simulations of ballistic sputtering and gas-phase transport. The fabrication of low-stress amorphous B₄C films with deposition rates of 7μm/h is demonstrated.

View Accepted Manuscript (DOE)

Research Organization:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities (SUF)

Grant/Contract Number:: AC02-05CH11231; AC52-07NA27344

OSTI ID:: 3000816

Report Number(s):: LLNL--JRNL-2006702

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 10 Vol. 138; ISSN 0021-8979; ISSN 1089-7550

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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