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Electrophysical Properties of Cd0.96Mn0.04Te0.96Se0.04 Surface-Barrier Diodes

Journal Article · · IEEE Transactions on Nuclear Science
Diode structures, obtained by vacuum deposition of Al onto the surface of a p-Cd0.96Mn0.04Te0.96Se0.04 single crystals, have been manufactured and studied. Applying the Sah-Noyce–Shockley carrier generation-recombination model, a quantitative description of the electrical characteristics of diodes has been achieved. Here, the resistivity of p-Cd0.96Mn0.04Te0.96Se0.04 crystals was equal to ρ ≈ 400 Ω⋅cm and was determined from the I–V characteristics of the structure with two ohmic contacts, which were obtained by chemical deposition of gold. The activation energy of the dark temperature dependence of resistivity ρ=ρ(T) was equal to ΔE≈0.24 eV. The forbidden gap of p-Cd0.96Mn0.04Te0.96Se0.04 crystals, found from the optical absorption spectra, was equal to Eg=1.495 eV.
Research Organization:
Brookhaven National Laboratory (BNL), Upton, NY (United States); Chernivtsi National University (Ukraine); Savannah River National Laboratory (SRNL), Aiken, SC (United States)
Sponsoring Organization:
Simons Foundation; USDOE National Nuclear Security Administration (NNSA), Office of Defense Nuclear Nonproliferation
Grant/Contract Number:
89303321CEM000080
OSTI ID:
2998364
Journal Information:
IEEE Transactions on Nuclear Science, Journal Name: IEEE Transactions on Nuclear Science Journal Issue: 9 Vol. 71; ISSN 0018-9499; ISSN 1558-1578
Publisher:
Institute of Electrical and Electronics Engineers (IEEE)Copyright Statement
Country of Publication:
United States
Language:
English

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