Low-temperature formation of Ti2AlN during post-deposition annealing of reactive multilayer systems

Journal Article · Tue Sep 17 04:00:00 EDT 2024 · Journal of Applied Physics

DOI:https://doi.org/10.1063/5.0230405· OSTI ID:2998310

Nnaji, Moses O. ^[1]; Tavakoli, David A. ^[1]; Hitchcock, Dale A. ^[2]; Vogel, Eric M. ^[1]

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1. Georgia Institute of Technology, Atlanta, GA (United States)
2. Savannah River National Laboratory (SRNL), Aiken, SC (United States)

M_n+1AXn-phase Ti₂AlN thin-films were synthesized using reactive sputtering-based methods involving the deposition of single-layer TiAlN, and Ti/AlN and TiN/TiAl multilayers of various modulation periods at ambient temperature and subsequent annealing at elevated temperatures. Ex situ and in situ x-ray diffraction measurements were used to characterize the Ti₂AlN formation temperature and phase fraction. During annealing, Ti/AlN multilayers yielded Ti₂AlN at a significantly lower in situ temperature of 650 °C compared to TiN/TiAl multilayers or single-layer TiAlN (750 °C). The results suggest a reactive multilayer mechanism whereby distinct Ti and AlN layers react readily to release exothermic energy resulting in lower phase transition temperatures compared to TiN and TiAl layers or mixed TiAlN. With a modulation period of 5 nm, however, Ti/AlN multilayers yielded Ti₂AlN at a higher temperature of 750 °C, indicating a disruption of the reactive multilayer mechanism due to a higher fraction of low-enthalpy interfacial TiAlN within the film.

• Research Organization: Georgia Institute of Technology
• Sponsoring Organization: National Science Foundation (NSF); U.S. Department of Energy, Office of Science, Fusion Energy Sciences Program Office’s Fusion Materials Research Program; U.S. Department of Energy (DOE) Office of Environmental Management (EM)
• DOE Contract Number: 89303321CEM000080
• OSTI ID: 2998310
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 136; ISSN 0021-8979
• Publisher: AIP Publishing
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
annealing
ceramics
depth profiling techniques
diffractometers
geometrical optics
piezoelectric films
raman spectroscopy
sputter deposition
thin film deposition
x-ray diffraction