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InGaAsN solar cells with 1.0 eV band gap, lattice matched to GaAs

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.123105· OSTI ID:295499
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  1. Sandia National Laboratories, Albuquerque, New Mexico 87185-0603 (United States)

The design, growth by metalorganic chemical vapor deposition, and processing of an In{sub 0.07}Ga{sub 0.93}As{sub 0.98}N{sub 0.02} solar cell, with 1.0 eV band gap, lattice matched to GaAs is described. The hole diffusion length in annealed, {ital n}-type InGaAsN is 0.6{endash}0.8 {mu}m, and solar cell internal quantum efficiencies {gt}70{percent} are obtained. Optical studies indicate that defects or impurities, from InGaAsN doping and nitrogen incorporation, limit solar cell performance. {copyright} {ital 1999 American Institute of Physics.}

OSTI ID:
295499
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 5 Vol. 74; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English