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Modulation-doped In{sub 0.53}Ga{sub 0.47}As/In{sub 0.52}Al{sub 0.48}As heterostructures grown on GaAs substrates using step-graded In{sub {ital x}}Ga{sub 1{minus}{ital x}}As buffers

Journal Article · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
DOI:https://doi.org/10.1116/1.589060· OSTI ID:288990
; ;  [1];  [2]
  1. Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, California 92093-0407 (United States)
  2. School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907 (United States)

We have grown modulation-doped In{sub 0.53}Ga{sub 0.47}As/In{sub 0.52}Al{sub 0.48}As heterostructures on GaAs substrates using compositionally step-graded In{sub {ital x}}Ga{sub 1{minus}{ital x}}As buffers. Triple-axis x-ray diffraction measurements indicate nearly complete and isotropic strain relaxation in the buffer, lattice matching of the active layers with the top of the buffer, and no significant epilayer tilt. The temperature dependence and the photoresponse of the electron mobility suggest that transport in the heterostructures is limited principally by remote ionized-impurity scattering, with mobility values comparable to those of heterostructures grown lattice-matched to InP. {copyright} {ital 1996 American Vacuum Society}

Research Organization:
Brookhaven National Laboratory
DOE Contract Number:
AC02-76CH00016; FG02-85ER45183
OSTI ID:
288990
Report Number(s):
CONF-960117--
Journal Information:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 4 Vol. 14; ISSN 0734-211X; ISSN JVTBD9
Country of Publication:
United States
Language:
English