Molecular beam epitaxial growth and characterization of mixed (Ti,Nb)O{sub 2} rutile films on TiO{sub 2}(100)

Journal Article · Wed May 01 04:00:00 EDT 1996 · Journal of Vacuum Science and Technology, A

DOI:https://doi.org/10.1116/1.579959· OSTI ID:285387

Chambers, S A; Gao, Y; Thevuthasan, S; Liang, Y ^[1]; Shivaparan, N R; Smith, R J ^[2]

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1. Environmental Molecular Sciences Laboratory, Pacific Northwest Laboratory, Richland, Washington 99352 (United States)
2. Department of Physics, Montana State University, Bozeman, Montana 59717 (United States)

Epitaxial films of mixed (Nb,Ti)O{sub 2} rutile have been grown on TiO{sub 2}(100) rutile at 600{degree}C by molecular beam epitaxy. These films grow in a laminar fashion for Nb mole fractions up to {approximately}0.10. In addition, reflection high-energy and low-energy electron diffraction, along with x-ray photoelectron diffraction and Rutherford backscattering reveal that the overlayers possess excellent long- and short-range structure order up to 10 at.{percent}. However, strain-induced disorder becomes prevalent for higher Nb mole fractions, and the surfaces roughen and become defected accordingly. X-ray photoelectron diffraction and Rutherford backscattering reveal that Nb atoms substitutionally incorporate at cation sites in the rutile lattice for all Nb mole fractions investigated, leading to a mixed rutile Nb{sub {ital x}}Ti{sub 1{minus}{ital x}}O{sub 2} phase. Analysis of Nb 3{ital d} and Ti 2{ital p} core-level binding energies reveals that the oxidation state of both Ti and Nb is +4. {copyright} {ital 1996 American Vacuum Society}

• Research Organization: Pacific Northwest National Laboratory
• DOE Contract Number: AC06-76RL01830
• OSTI ID: 285387
• Report Number(s): CONF-9510385--
• Journal Information: Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 3 Vol. 14; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHEMICAL BONDS
CRYSTAL DEFECTS
ELECTRONIC STRUCTURE
FILMS
MOLECULAR BEAM EPITAXY
NIOBIUM OXIDES
SHORT-RANGE ORDER
STRESSES
SUBSTITUTION
SUBSTRATES
TEMPERATURE RANGE 0400-1000 K
TITANIUM OXIDES