Epitaxial growth and characterization of Nb{sub x}Ti{sub 1{minus}x}O{sub 2} rutile films by oxygen-plasma-assisted molecular beam epitaxy
Book
·
OSTI ID:392154
- Pacific Northwest National Lab., Richland, WA (United States). Environmental Molecular Sciences Lab.
Epitaxial films of Nb{sub x}Ti{sub 1{minus}x}O{sub 2} rutile were grown on TiO{sub 2} (110) and (100) at 600 C by oxygen-plasma-assisted molecular beam epitaxy using elemental Ti and Nb sources. The epitaxial films were characterized by means of reflection high-energy and low-energy electron diffraction (RHEED/LEED), x-ray photoelectron spectroscopy and diffraction (XPS/XPD), ultraviolet photoemission spectroscopy (UPS) and atomic force microscopy (AFM). The epitaxial films grow in a layer-by-layer fashion and have excellent short- and long-range structure order at x {le} 0.3 on TiO{sub 2} (110) and at x {le} 0.15 on TiO{sub 2} (100). However, the epitaxial films become rough and disorder at higher doping levels. Nb substitutionally incorporates at cation lattice sites, leading to Nb{sub x}Ti{sub 1{minus}x}O{sub 21} solid solutions. In addition, the oxidation state of Nb in the Nb{sub x}Ti{sub 1{minus}x}O{sub 2} films has been determined to be +4.
- DOE Contract Number:
- AC06-76RL01830
- OSTI ID:
- 392154
- Report Number(s):
- CONF-951155--; ISBN 1-55899-304-5
- Country of Publication:
- United States
- Language:
- English
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