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Molecular Beam Epitaxial Growth and Characterization of Mixed (Ti,Nb)O2 Rutile Films on TiO2(100)

Journal Article · · Journal of Vacuum Science and Technology A--Vacuum, Surfaces and Films
DOI:https://doi.org/10.1116/1.579959· OSTI ID:1582552
Epitaxial films of mixed (Nb,Ti)O2 rutile have been grown on TiO2(100) rutile at 600 degrees C by molecular beam epitaxy. These films grow in a laminar fashion for Nb mole fractions up to ~0.10. In addition, reflection high-energy and low-energy electron diffraction, along with x-ray photoelectron diffraction and Rutherford backscattering reveal that the overlayers posses excellent long- and short-range structure order up to 10 at.%. However, strain-induced disorder becomes prevalent for higher Nb mole fractions, and the surface roughen and become defected accordingly. X-ray photoelectron diffraction and Rutherford backscattering reveal that Nb atoms substitiutionally incorporate at cation sites in the rutile lattice for all nb mole fractions investigated, leading to a mixed rutile NbxTi1-xO2 phase. Analysis of Nb 3d and Ti 2p core-level binding energies reveals that the oxidation state of both ti and nb is +4.
Research Organization:
Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC05-76RL01830
OSTI ID:
1582552
Report Number(s):
PNNL-SA-26770
Journal Information:
Journal of Vacuum Science and Technology A--Vacuum, Surfaces and Films, Journal Name: Journal of Vacuum Science and Technology A--Vacuum, Surfaces and Films Journal Issue: 3 Vol. 14
Country of Publication:
United States
Language:
English

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