Growth of diamond thin films by microwave plasma chemical vapor deposition process

Journal Article · Sun Mar 31 23:00:00 EST 1996 · Journal of Materials Research

DOI:https://doi.org/10.1557/JMR.1996.0127· OSTI ID:280131

Barshilia, H C; Metha, B R; Vankar, V D ^[1]

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1. Thin Film Laboratory, Department of Physics, Indian Institute of Technology, New Delhi-110 016 (India)

A very high vacuum compatible microwave plasma chemical vapor deposition system has been fabricated for the growth of diamond thin films. Microcrystalline diamond thin films have been grown on silicon substrates from CH{sub 4}{endash}H{sub 2} gas mixture. Scanning electron microscopy and X-ray diffraction have been used to study the surface morphology and the crystallographic structure of the films. Optical emission spectroscopy has been used for the detection of chemical species present in the plasma. The strong dependence of the film microstructure on the intensity of CH emission line has been observed. {copyright} {ital 1996 Materials Research Society.}

• OSTI ID: 280131
• Journal Information: Journal of Materials Research, Journal Name: Journal of Materials Research Journal Issue: 4 Vol. 11; ISSN JMREEE; ISSN 0884-2914
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHEMICAL VAPOR DEPOSITION
DIAMONDS
EMISSION SPECTRA
FILM GROWTH
HIGH-FREQUENCY DISCHARGES
MICROSTRUCTURE
OPTICAL MATERIALS
PLASMA DIAGNOSTICS
PLASMA SOURCES
THIN FILMS