Magnetic properties of epitaxial and polycrystalline Fe/Si multilayers
- Materials Science and Technology Division, Lawrence Livermore National Laboratory, Livermore, California 94551 (United States)
- Department of Materials Science and Engineering, Stanford University, Palo Alto, California 94305 (United States)
Fe/Si multilayers with antiferromagnetic interlayer coupling have been grown via ion-beam sputtering on both glass and single-crystal substrates. High-angle x-ray diffraction measurements show that both sets of films have narrow Fe peaks, implying a large crystallite size and crystalline iron silicide spacer layers. Low-angle x-ray diffraction measurements show that films grown on glass have rougher interfaces than those grown on single-crystal substrates. The multilayers grown on glass have a larger remanent magnetization than the multilayers grown on single-crystal substrates. The observation of magnetocrystalline anisotropy in hysteresis loops and ({ital hkl}) peaks in x-ray diffraction demonstrates that the films grown on MgO and Ge are epitaxial. The smaller remanent magnetization in Fe/Si multilayers with better layering suggests that the remanence is not an intrinsic property. {copyright} {ital 1996 American Institute of Physics.}
- Research Organization:
- Lawrence Livermore National Laboratory
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 280010
- Report Number(s):
- CONF-951101--
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 79; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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