Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Experimental evidence of the temperature and angular dependence in SEGR

Journal Article · · IEEE Transactions on Nuclear Science
DOI:https://doi.org/10.1109/23.510737· OSTI ID:277735
 [1];  [2];  [3]
  1. Motorola Semiconducteurs, Toulouse (France)
  2. Aerospatiale, Les Mureaux (France)
  3. Alcatel Espace, Toulouse (France); and others

Double-diffused metal-oxide-semiconductor (DMOS) power devices are capable of conducting large currents when turned on and withstanding large voltages when turned off. Power DMOS transistors are widely used in space applications. However, in the cosmic-ray environment, they are exposed to energetic heavy ions. The passage of a single heavy ion through the device can lead to significant permanent degradation of the device or even catastrophic failure. In power Metal-Oxide-Semiconductor Field Effect Transistors (MOSFETs), two single event effects have been observed: Single-Event Burnout (SEB) and SEGR. These phenomena can be understood in terms of the physical structure of the device. Here, the temperature and angular dependence of Single-Event Gate Rupture (SEGR) experiments show that a normal incident angle favors SEGR and elevated temperature is insignificant. Both the oxide and substrate response play a major role in determining the SEGR sensitivity.

OSTI ID:
277735
Report Number(s):
CONF-9509107--
Journal Information:
IEEE Transactions on Nuclear Science, Journal Name: IEEE Transactions on Nuclear Science Journal Issue: 3Pt1 Vol. 43; ISSN 0018-9499; ISSN IETNAE
Country of Publication:
United States
Language:
English

Similar Records

A review of the techniques used for modeling single-event effects in power MOSFET`s
Journal Article · Sun Mar 31 23:00:00 EST 1996 · IEEE Transactions on Nuclear Science · OSTI ID:242434

Evaluation of SEGR threshold in power MOSFETs
Conference · Wed Nov 30 23:00:00 EST 1994 · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) · OSTI ID:6488620

SEGR and SEB in n-channel power MOSFETs
Journal Article · Sat Nov 30 23:00:00 EST 1996 · IEEE Transactions on Nuclear Science · OSTI ID:445460