A closed CVD system for the deposition on diamond films
Conference
·
OSTI ID:230072
- National Institute of Standards and Technology, Gaithersburg, MD (United States); and others
The results of diamond film depositions based on a closed hot filament chemical vapor deposition (HFCVD) system are given. In this process, no flowing feed gases are used; only a small amount of hydrogen and a solid graphite source are used. Typical deposition conditions are: nominal filament temperature, 1800{degrees}C; nominal substrate temperature, 750{degrees}C; deposition chamber pressure, 1.3 kPa to 10.6 kPa (10 torr to 80 torr); filament-substrate spacing, 4 mm; filament-graphite rod spacing, 7 mm to 20 mm. Growth rates of 0.1 {mu}m/h were achieved. The presence of the diamond phase was verified by x-ray diffraction (XRD) and Raman spectroscopy.
- OSTI ID:
- 230072
- Report Number(s):
- CONF-950840--
- Country of Publication:
- United States
- Language:
- English
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