Plasma-Chemical Deposition of Diamond-Like Films onto the Surface of Heavily Doped Single-Crystal Diamond
- Institute for Physics of Microstructures, Russian Academy of Sciences (Russian Federation)
The plasma-chemical deposition of diamond-like carbon (DLC) films onto heavily boron-doped single-crystal p-type diamond (the concentration ~10{sup 20} cm{sup –3}) in CH{sub 4} + Ar plasma is conducted. The deposition rate is 7 nm min{sup –1}. The elemental composition and properties of the films are studied in detail. It is found that the films are enriched with hydrogen, possess a density of 2.4 g cm{sup –3}, and exhibit an ultrasmooth surface (with a roughness of 0.4 ± 0.2 nm).
- OSTI ID:
- 22944875
- Journal Information:
- Semiconductors, Journal Name: Semiconductors Journal Issue: 9 Vol. 53; ISSN SMICES; ISSN 1063-7826
- Country of Publication:
- United States
- Language:
- English
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