Surface Topography and Optical Properties of Thin AlN Films Produced on GaAs (100) Substrate by Reactive Ion-Plasma Sputtering

Journal Article · Fri Mar 15 00:00:00 EDT 2019 · Technical Physics Letters

DOI:https://doi.org/10.1134/S1063785019030076· OSTI ID:22929309

Bondarev, A. D. ^[1]; Rumyantseva, A. I.; Maurer, T. ^[2]; Pikhtin, N. A. ^[1]; Tarasov, S. A. ^[3]

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1. Ioffe Physical Technical Institute, Russian Academy of Sciences (Russian Federation)
2. Laboratoire de Nanotechnologie et d’Instrumentation Optique, ICD CNRS UMR 6281, Université d’Technologie de Troyes (France)
3. St. Petersburg State Electrotechnical University LETI (Russian Federation)

A study of the surface topography and optical characteristics of thin AlN films used as passivating and antireflection coatings deposited on n-GaAs (100) substrates by reactive ion-plasma sputtering is reported. It was found that the process conditions affect the structure and the optical characteristics of the films, which makes it possible to obtain coatings with prescribed parameters. An analysis of the results furnished by ellipsometry and atomic-force microscopy of the surface shows that the refractive index of the films is correlated with the surface structure.

• OSTI ID: 22929309
• Journal Information: Technical Physics Letters, Vol. 45, Issue 3; Other Information: Copyright (c) 2019 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7850
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ALUMINIUM NITRIDES
ANTIREFLECTION COATINGS
ATOMIC FORCE MICROSCOPY
ELLIPSOMETRY
GALLIUM ARSENIDES
IONS
N-TYPE CONDUCTORS
PLASMA
REFRACTIVE INDEX
SPUTTERING
SURFACES
THIN FILMS
TOPOGRAPHY